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  About site: http://www.tectra.de/hydrogen.htm

Title: Energy and Environment/Hydrogen - Atomic Hydrogen Source The H-flux Atomic Hydrogen Source thermally dissociates hydrogen in an electron bombardment heated tungsten capillary. Used for surface science and thin film technology.
California_Hydrogen_Business_Council Offers hydrogen information with a slant on applications in California.

Compagnie_Européenne_des_Technologies_de_l\'Hydrogène Develops decentralized hydrogen generators for stationary and transport applications. Products include catalytic membrane reactors for converting bioethanol, and electrolyzers.

Coval_H2_Partners California company integrating battery-powered and hybrid-electric vehicles and stationary power systems. Overview of current and future application areas.

Elettronica_Todescato Production generators of hydrogen and oxygen that produce the two gases with the solo use of electric energy and water.

Energy_Consultants,_LLP Offers business advisory services for harvesting revenue from fuel cell, hydrogen, wind power and other emerging energy or renewable energy technologies.

ForeverGreen_Enterprises,_Inc_ Aims to provide technology for converting waste materials into hydrogen using a plasma-based process. Overview of business, applications, and technology.


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Atomic Hydrogen Source - thermal hydrogen cracker                   Reuterweg 65 • D-60323 Frankfurt/M Tel +49 (0)69-720040 Fax +49 (0)69-720400 • info@tectra.de Impressum AGBs   H-flux

Atomic Hydrogen Source

Thermal hydrogen cracker

H-flux Atomic Hydrogen Source with optional shutter The new H-flux Atomic Hydrogen Source* works by thermally dissociating hydrogen in an electron bombardment heated fine tungsten capillary (thermal hydrogen cracker). By bouncing along the hot walls the molecular hydrogen is cracked to atomic hydrogen. This is e.g. very useful for in-situ, damage free cleaning of residual oxygen prior to sample coating or analysis. Other applications are in surface modifications appreciating the high reactivity of atomic species. The H-flux Atomic Hydrogen Source is UHV compatible and mounted on a NW35CF (2.75"OD) flange, making the source an easy retrofit to existing vacuum systems. Applications: Atomic Hydrogen can be used in surface science and thin film technolgy (MBE, GSMBE) mainly for the following applications: damage free in situ cleaning e.g GaAs, InP, Ge and Si. Removal of residual oxygen and carbon.Low temperature cleaningSurfactant - improvement of layer properties during growth post growth surface treatment/improvement chemical passivation and surface reconstruction annealing of amorphous silicon Key Features: Key features of the H-flux Atomic Hydrogen Source are the zero residual ion current and almost 100% cracking efficiency, due to the superior and unique Bertel design. Integral watercooling is included as standard to minimise heat load in the system and outgassing. A manual shutter is available as option. Zero residual ion currentAlmost 100% cracking efficiencyIntegral water-cooling as standard to minimise heat load in the system and outgassing Capable of operation in UHV without differential pumping Thermocouple and PID controller as standard for reproducible and constant operation Filament made of standard Tungsten wire for inexpensive on-site replacement Specifications: Typical operating conditions: the flux of Hydrogen atoms at 10-9 mbar in a chamber with typical pumps at a distance of 10cm is ca. 5x1013 atoms/cm². Source Properties: Gas Flow: 10-5 sccm to 1sccm Operating Pressure:<10-10 to 10-5 mbar Hydrogen Flux: ~5x1013 atoms/cm² @ 10cm distance and 10-9 mbar Beam Divergence: ~15° half angle Source Hardware: High Voltage:1,2kV (max) adjustable Beam current: 50mA (max) adjustable Power:60W (max) adjustable via voltage and current In vacuum length: 190mm (without shutter) In vacuum diameter: 34mm (max) Mounting Flange:NW40CF (2.75") Leak valve: required (see option) Integral cooling:water Bakeable:200°C   Power Supply: HV connection via over-specified high voltage feedthrough with matching connector potted onto the cable and screw-on retaining sleeve for high-level user safetyAll feedthroughs are user demountable for on-site service/repair Filaments are easily replaced and user fabricated from 0.3mm tungsten wire of near zero running costs Water-cooled copper jacket to minimise radiated heat and outgassing Water connection via 1/4” Swagelok fittings Gas connection via mini-Conflat (NW16CF) flange Additional spare NW 16CF ports on the multiport for future upgrade with the options listed above 19" rack mount, 3U high, 230VAC/50Hz (115VAC/60Hz optional) Options: Manual shutter: can be operated and closed within the ID of an DN40CF port.Shutter actuator: for remote/computer controlled shutter operation. References: "Simple source of atomic hydrogen for ultrahigh vacuum applications", U. Bischler and E. Bertel; J. Vc. Sci. Technol. A 11(2), Mar/Apr 1993 "Quantitative characterisation of a highly effective atomic hydrogen doser", C. Eibl, G. Lackner, and A. Winkler. J.; Vac. Sci. Technol. A 16(5), Sep/Oct 1998. Atomic Hydrogen Source (front view) * In cooperation with Prof. Dr. E. Bertel of the University of Innsbruck In the interests of continuous product development, specifications are subject to change without notice. Quick links to other major tectra products: Electron Beam Evaporator - 4-pocket e-beam evaporator - Plasma Source - Atomic Hydrogen Source - Sputter Gun - Mini-Coater Deposition System - Sputter-Coater       contact: contact: Dipl.-Ing. Andreas Gati tectra GmbH Reuterweg 65 D-60323 Frankfurt phone: Germany (0) 69 - 72 00 40 fax: Germany (0) 69 - 72 04 00 email: info@tectra.de home: www.tectra.de   last update: 26.5.06 TOP
 

The

H-flux

Atomic

Hydrogen

Source

thermally

dissociates

hydrogen

in

an

electron

bombardment

heated

tungsten

capillary.

Used

for

surface

science

and

thin

film

technology.

http://www.tectra.de/hydrogen.htm

Atomic Hydrogen Source 2008 December

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The H-flux Atomic Hydrogen Source thermally dissociates hydrogen in an electron bombardment heated tungsten capillary. Used for surface science and thin film technology.

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